Polar decomposition of the Mueller matrix: a polarimetric rule of thumb for square-profile surface structure recognition

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URI: http://hdl.handle.net/10902/3759
ISSN: 1559-128X
ISSN: 2155-3165
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Autoría
Sanz Casado, Juan MarcosAutoridad Unican; Saiz Vega, José MaríaAutoridad Unican; González Fernández, FranciscoAutoridad Unican; Moreno Gracia, FernandoAutoridad Unican
Fecha
2011-07
Derechos
© 2011 Optical Society of America, This paper was published in Applied Optics and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://dx.doi.org/10.1364/AO.50.003781. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
Publicado en
Applied Optics, Vol. 50, Issue 21, pp. 3781-3788 (2011)
Editorial
The Optical Society (OSA)
Resumen/Abstract
In this research, the polar decomposition (PD) method is applied to experimental Mueller matrices (MMs) measured on two-dimensional microstructured surfaces. Polarization information is expressed through a set of parameters of easier physical interpretation. It is shown that evaluating the first derivative of the retardation parameter, δ, a clear indication of the presence of defects either built on or dug in the scattering flat surface (a silicon wafer in our case) can be obtained. Although the rule of thumb thus obtained is established through PD, it can be easily implemented on conventional surface polarimetry. These results constitute an example of the capabilities of the PD approach to MM analysis, and show a direct application in surface characterization.
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