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dc.contributor.authorLiu, Guangqing
dc.contributor.authorChen, Jason
dc.contributor.authorLichtensteiger, Céline
dc.contributor.authorTriscone, Jean-Marc
dc.contributor.authorAguado Puente, Pablo
dc.contributor.authorJunquera Quintana, Francisco Javier 
dc.contributor.authorValanoor, Nagarajan
dc.contributor.otherUniversidad de Cantabriaes_ES
dc.date.accessioned2024-01-30T16:11:59Z
dc.date.available2024-01-30T16:11:59Z
dc.date.issued2016-01
dc.identifier.issn2199-160X
dc.identifier.otherFIS2012?37549-C05-04es_ES
dc.identifier.urihttps://hdl.handle.net/10902/31330
dc.description.abstractThe effect of intentionally introducing a large depolarization field in (001)-oriented, epitaxial Pb(Zr0.2TiO0.8)O3 (PZT) ultrathin films grown on La0.67Sr0.33MnO3 (LSMO) buffered SrTiO3 (STO) substrates is investigated. Inserting between 3 and 10 unit cells of STO between two 3 nm thick PZT films significantly influences the out-of-plane (c) lattice constant as well as the virgin domain state. Piezoresponse force microscopy images reveal a nanoscale (180°) polydomain structure in these films. In comparison, a “reference” single layer PZT sample (6 nm thick without STO spacer) exhibits an elongated PZT c-axis (0.416 nm) and is preferentially “down”-polarized with large regions of monodomain contrast. It shows asymmetric switching loops (i.e., imprint) coupled with sluggish domain switching under external bias. It is shown that the insertion of STO drives a monodomain to 180° polydomain transition in the as-grown state, which reduces the imprint by 80%. The insertion of the STO also profoundly improves dielectric leakage and hence the distribution of the applied electric field. Consequently, the critical pulse duration of the electric field required to initiate domain switching is reduced by two orders of magnitude relative to the reference sample. These results demonstrate the possibility of manipulating the depolarization field in such a way that it has positive effects on the ferroelectric behavior of ultrathin PZT films.es_ES
dc.description.sponsorshipAcknowledgements: G.L. and J.C. contributed equally to this work. G.L., J.C., and N.V. acknowledge support from ARC Discovery Project. N.V. acknowledges valuable discussions with Prof. P. Alpay and Prof. Anna Morozovska. C.L. and J.-M.T. thank support from the Swiss National Science Foundation division II. P.A.-P. and J.J. acknowledge the Spanish Ministry of Science and Innovation through the MICINN Grant FIS2012–37549-C05-04 and by the European Union through the project EC-FP7, Grant No. CP-FP 228989–2 “OxIDes.”es_ES
dc.format.extent10 p.es_ES
dc.language.isoenges_ES
dc.publisherWiley-Blackwelles_ES
dc.rightsAlojado según Resolución CNEAI 5/12/23 (ANECA) © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheimes_ES
dc.sourceAdvanced Electronic Materials, 2016, 2(1), 15002881es_ES
dc.titlePositive effect of an internal depolarization field in ultrathin epitaxial ferroelectric filmses_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.relation.publisherVersionhttps://doi.org/10.1002/aelm.201500288es_ES
dc.rights.accessRightsclosedAccesses_ES
dc.relation.projectIDinfo:eu-repo/grantAgreement/EC/FP7/228989/EU/Engineering Exotic Phenomena at Oxide Interfaces/OXIDES/es_ES
dc.identifier.DOI10.1002/aelm.201500288
dc.type.versionpublishedVersiones_ES


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