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dc.contributor.authorValdiande Gutiérrez, José Julián 
dc.contributor.authorMirapeix Serrano, Jesús María 
dc.contributor.authorNin, Jaume
dc.contributor.authorFont, Eloi
dc.contributor.authorSeijas, Carlos
dc.contributor.authorLópez Higuera, José Miguel 
dc.contributor.otherUniversidad de Cantabriaes_ES
dc.date.accessioned2021-06-03T08:31:53Z
dc.date.available2021-06-03T08:31:53Z
dc.date.issued2021-04-26
dc.identifier.issn1077-260X
dc.identifier.issn1558-4542
dc.identifier.otherPID2019-107270RB-C21es_ES
dc.identifier.urihttp://hdl.handle.net/10902/21826
dc.description.abstractPlasma spectroscopic techniques focused on the analysis of the plasma background radiation have been studied to enable an efficient on-line monitoring of a laser metal deposition process. The influence of different process parameters and elements, such as laser power, process speed, powder feeding rate and different powder and substrate compositions has been analyzed by means of several experimental trials. The resulting cladding patch analyzes via visual inspection and macrographs have been correlated with their associated spectroscopic monitoring signals. These studies have indicated that on-line quality monitoring of the laser metal deposition process is feasible by means of the proposed solutions, avoiding the identification and use of plasma emission lines. The latter improves the computational performance and avoids, not only the identification of each emission line, but also their specific sensitivity to certain defects. Spectral correlation techniques have also been proposed for monitoring purposes, thus enabling a more quantitative analysises_ES
dc.description.sponsorshipThis work was supported in part by the Project “Noves tecnologies de laser cladding per a processos de conformat” (RD15-1-0098) funded by ACCIO (Generalitat de Catalunya) via FEDER funds. This work was also supported by projects PID2019-107270RB-C21/ AEI / 10.13039/501100011033.es_ES
dc.format.extent9 p.es_ES
dc.language.isoenges_ES
dc.publisherInstitute of Electrical and Electronics Engineers, Inc.es_ES
dc.rights© 2021 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.es_ES
dc.sourceIEEE Journal of Selected Topics in Quantum Electronics, 2021, 27(6), 7701108es_ES
dc.subject.otherOptical sensores_ES
dc.subject.otherLaser metal depositiones_ES
dc.subject.otherOn-line monitoringes_ES
dc.subject.otherPlasma spectroscopyes_ES
dc.subject.otherQuality assurancees_ES
dc.subject.otherCorrelation techniqueses_ES
dc.subject.otherMacrographses_ES
dc.titleLaser metal deposition on-line monitoring via plasma emission spectroscopy and spectral correlation techniqueses_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.relation.publisherVersionhttps://doi.org/10.1109/JSTQE.2021.3075489es_ES
dc.rights.accessRightsopenAccesses_ES
dc.identifier.DOI10.1109/JSTQE.2021.3075489
dc.type.versionacceptedVersiones_ES


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