dc.contributor.author | González Pérez, Benito | |
dc.contributor.author | Aja Abelán, Beatriz | |
dc.contributor.author | Artal Latorre, Eduardo | |
dc.contributor.author | Lázaro Guillén, Antonio | |
dc.contributor.author | Núnez Ordónez, Antonio | |
dc.contributor.other | Universidad de Cantabria | es_ES |
dc.date.accessioned | 2019-12-10T15:58:10Z | |
dc.date.available | 2019-12-10T15:58:10Z | |
dc.date.issued | 2019-10 | |
dc.identifier.issn | 0018-9383 | |
dc.identifier.issn | 1557-9646 | |
dc.identifier.other | TEC2015-67883-R | es_ES |
dc.identifier.other | RTI2018-096019-B-C31 | es_ES |
dc.identifier.uri | http://hdl.handle.net/10902/17441 | |
dc.description.abstract | Thermal capacitances are required to describe the fast dynamic thermal behavior in the silicon-on-insulator (SOI) devices. This article presents a physical model based on the ac technique, together with the characteristic thermal frequency determination through the frequency response of the output conductance, for calculating the thermal capacitance of single-finger and multi-finger SOI-MOSFETs. The model accounts for the total gate width and substrate temperature, making evident the augmented thermal coupling when multi-fingers are used. The thermal capacitances and the corresponding time constants, extracted from a variety of gate widths and number of fingers, are correctly predicted up to a substrate temperature of 150 °C. | es_ES |
dc.description.sponsorship | This work was supported by the Spanish MEC under Project GREENSENSE−TEC2015-67883-R and RTI2018-096019-B-C31 | es_ES |
dc.format.extent | 7 p. | es_ES |
dc.language.iso | eng | es_ES |
dc.publisher | Institute of Electrical and Electronics Engineers Inc. | es_ES |
dc.rights | © 2019 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. | es_ES |
dc.source | IEEE Transactions on Electron Devices, 2019, 66(10), 4120-4125 | es_ES |
dc.subject.other | Electrothermal characterization | es_ES |
dc.subject.other | Model | es_ES |
dc.subject.other | SOI-MOSFET | es_ES |
dc.subject.other | Substrate temperature | es_ES |
dc.subject.other | Thermal capacitance | es_ES |
dc.title | Temperature-dependent thermal capacitance characterization for SOI-MOSFETs | es_ES |
dc.type | info:eu-repo/semantics/article | es_ES |
dc.relation.publisherVersion | https://doi.org/10.1109/TED.2019.2935500 | es_ES |
dc.rights.accessRights | openAccess | es_ES |
dc.identifier.DOI | 10.1109/TED.2019.2935500 | |
dc.type.version | acceptedVersion | es_ES |